Recent publications

New book with authors from NCSRD/INN/Nano4NPS: Beyond-CMOS Nanodevices 1 

The new book offers a comprehensive review of the state-of-the-art in innovative Beyond-CMOS nanodevices, including the results of NANOFUNCTION Network of Excellence. Members from the team led by NCSRD-INN Director of Research Dr. Androula G. Nassiopoulou are among its authors.

In a recent publication in the proceedings of the Workshop on Low Temperature Electronics (WOLTE)  the Nano4NPS group studied the application of porous silicon as an efficient local thermal isolation platform on the Si wafer in the temparature range 5–350K.

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In a recent publication in Nanoscale Research Letters the Nano4NPS group studied the dielectric properties of porous silicon for use as a substrate for the on-chip integration of millimeter-wave devices. The frequency range under investigation was from 140 to 210 GHz.

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In a recent publication in Nanoscale Research Letters the Nano4NPS group studied the thermal properties of Porous Si in the temperature range 4.2 - 20K

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In a recent publication in Applied Physics Letters the Nano4NPS group presented evidence of significant down-conversion in a Si-based solar cell using CuInS2/ZnS core shell quantum dots

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In a recent publication in Sensors the Nano4NPS group presented a sensitive miniaturized Si thermoelectric generator using porous Si thermal isolation  (see here for more)

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In a recent publication in Nanoscale Research Letters the Nano4NPS group investigated the structure, morphology and light emitting properties of Si nanowires by metal-assisted chemical etching  (see here for more)

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In a recent publication in the J. Phys. D: App. Phys. the Nano4NPS group demonstrated the superiority of porous Si as a local thermal isolation platform on bulk crystalline Si at cryogenic temperatures (see here for more)

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In a recent publication in Solid State Electronics the Nano4NPS group demonstrated the superiority of porous Si  for its use as a substrate material in Si-integrated RF passive devices (see summary here).

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The Nano4NPS group investigated the formation of a nanopatterned Si surface for RF applications using RIE through a self-assembled porous anodic alumina thin film (see summary here). The results were published in Nanoscale Research Letters.

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In a recent IEEE TED paper the Nano4NPS group investigated the dielectric properties of  porous Si for its application as a local RF shielding platform on the Si wafer.

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